Plasmonic Nanoparticles for Large-Area, High- Enhancement Surface-Enhanced Raman Scattering Sensors

Silicon technology offers almost unlimited possibilities and pervades our day life the main reason in the information technology is to have the possibility of integrating low – dimensional structures showing appropriate optoelectronic properties with well-established and highly advanced silicon microelectronics technology.

The structural and morphological properties of electrochemically etched porous silicon are investigated using SEM, The porous silicon layers were formed in 40% HF solution and ethanol of 99% in a ratio of n-type silicon. The surface morphology as characterized by scanning electron microscope reveals that the variation in etching time can produce microscopic roughness on the etched surfaces.

The AuNPAs/PS that deposited on porous silicon nano-photonic sensors have been used for performing SERS detections of low concentration of chlorpyrifos pesticide, with concentration 25*10-8 to 3*10-5 M.