ALLANAZAROVA SARVINOZ SHAVKAT QIZI, Allayarova Gulmira Xolmuratovna,. Effects of Low-Energy Ion Implantation on the Physicochemical Properties of Si Oxides. American Journal of Bioscience and Clinical Integrity, [S. l.], v. 3, n. 2, p. 128–133, 2026. DOI: 10.51699/ajbci.v3i2.2090. Disponível em: https://biojournals.us/index.php/AJBCI/article/view/2090. Acesso em: 4 jun. 2026.